Influence of the temperature on the properties of indium oxide obtained via wet oxidation method
Abstract
Oxidation temperature was found to affect the structural and electrical properties of the In2O3 films fabricated via wet oxidation technique. Prior to the oxidation process, gold (Au) and indium (In) films were deposited on the p-type Silicon (100) substrate via electron beam deposition and resistive thermal evaporation respectively. Preferential growth of the (111) plane was observed for In2O3 films grown at temperature greater than or equal to 600°C. Below this temperature, In metal was not completely oxidized. SEM images show the increasing number as well as areas of voids in the indium oxide films with increasing temperature. From the I-V measurements, the increase in oxidation temperature is also accompanied by the change of the contact behavior of the films from Schottky to ohmic.