X-ray diffraction grating produced via UV lithography and chemical wet etching

Authors

Francesca Isabel de Vera ⋅ PH National Institute of Physics, University of the Philippines Diliman
Fritz Christian Awitan ⋅ PH National Institute of Physics, University of the Philippines Diliman
Roland Sarmago ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

A straightforward recipe for fabricating an x-ray beam splitter using UV lithography and wet chemical etching was described. Exact alignment of the SiO2 mask parallel to the {111} direction resulted a straight vertical etching of Si with KOH.

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Issue

2011: Proceedings of the 29th Samahang Pisika ng Pilipinas National Physics Congress

Celebrating new ideas in physics
24-26 October 2011, University of the Philippines Diliman, Quezon City

Article ID

SPP2011-PB-40

Section

Poster Session PB

Published

2011-10-24

How to Cite

[1]

FI de Vera, FC Awitan, and R Sarmago, X-ray diffraction grating produced via UV lithography and chemical wet etching, Proceedings of the Samahang Pisika ng Pilipinas 29, SPP2011-PB-40 (2011). URL: https://proceedings.spp-online.org/article/view/SPP2011-PB-40.