X-ray diffraction grating produced via UV lithography and chemical wet etching

Authors

  • Francesca Isabel de Vera ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Fritz Christian Awitan ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Roland Sarmago ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

A straightforward recipe for fabricating an x-ray beam splitter using UV lithography and wet chemical etching was described. Exact alignment of the SiO2 mask parallel to the {111} direction resulted a straight vertical etching of Si with KOH.

SPP2011 Conference Proceedings Cover

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Published

2011-10-24

Issue

2011: Proceedings of the 29th Samahang Pisika ng Pilipinas National Physics Congress

Section

Poster Session PB

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How to Cite

[1]
FI de Vera, FC Awitan, and R Sarmago, X-ray diffraction grating produced via UV lithography and chemical wet etching, in Proceedings of the 29th Samahang Pisika ng Pilipinas National Physics Congress (Philippines, 2011), SPP2011-PB-40. URL: https://proceedings.spp-online.org/article/view/SPP2011-PB-40
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