Epitaxy of/on 2D materials: From interface engineering to device applications
Abstract
Recent advances in two-dimensional (2D) materials have enabled new device opportunities, yet achieving high performance requires precise control of interfaces and integration. While epitaxy of 2D materials on conventional substrates has been extensively studied, the emerging concept of epitaxy on 2D materials remains less explored. In this talk, I will present our recent advancements in epitaxy on 2D materials, including 2D-2D epitaxy and the growth of epitaxial metal and oxide layers on 2D MoS2. The resulting high-quality oxides enable integration of high-k dielectrics, leading to MoS2 top-gate FETs with sub-nanometer equivalent oxide thickness (EOT) and high transconductance. Furthermore, I will discuss the feasibility of remote epitaxy of metals on MoS2 mediated by ultrathin oxide interlayers, highlighting new pathways for scalable device integration and interface design.








