Determining the dominant THz mechanism of highly doped silicon by applying an external magnetic field in the THz-TDS set-up
Abstract
The dominant terahertz emission mechanism of highly doped silicon was determined by applying an external magnetic field of 0.65 T parallel to the surface of the sample. It was found via time-domain terahertz spectroscopy that with +0.65 and -0.65 T, a 14.49% increase and -3.71% decrease in terahertz emission was observed with almost no phase shift. Highly doped Si has a dominant surface field mechanism.
Downloads
Published
2016-08-18
Issue
Section
Optics and Photonics
Copyright Information
©
2017
Philippe Martin B. Tingzon, Lorenzo Lopez, Jr., Alexander De los Reyes, Joselito Muldera, Arnel Salvador, Elmer Estacio, Armando Somintac
Copyright License Agreement for Full Articles
How to Cite
[1]
PMB Tingzon, L Lopez, A De los Reyes, J Muldera, A Salvador, E Estacio, and A Somintac, Determining the dominant THz mechanism of highly doped silicon by applying an external magnetic field in the THz-TDS set-up, in Proceedings of the 34th Samahang Pisika ng Pilipinas Physics Conference (Philippines, 2016), SPP-2016-2A-02. URL: https://proceedings.spp-online.org/article/view/SPP-2016-2A-02








