Determining the dominant THz mechanism of highly doped silicon by applying an external magnetic field in the THz-TDS set-up

Authors

  • Philippe Martin B. Tingzon ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Lorenzo Lopez, Jr. ⋅ PH Materials Science Engineering Program, University of the Philippines Diliman
  • Alexander De los Reyes ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Joselito Muldera ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Arnel Salvador ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Elmer Estacio ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Armando Somintac ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

The dominant terahertz emission mechanism of highly doped silicon was determined by applying an external magnetic field of 0.65 T parallel to the surface of the sample. It was found via time-domain terahertz spectroscopy that with +0.65 and -0.65 T, a 14.49% increase and -3.71% decrease in terahertz emission was observed with almost no phase shift. Highly doped Si has a dominant surface field mechanism.

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Article ID

SPP-2016-2A-02

Section

Optics and Photonics

Published

2016-08-18

How to Cite

[1]
PMB Tingzon, L Lopez, A De los Reyes, J Muldera, A Salvador, E Estacio, and A Somintac, Determining the dominant THz mechanism of highly doped silicon by applying an external magnetic field in the THz-TDS set-up, Proceedings of the Samahang Pisika ng Pilipinas 34, SPP-2016-2A-02 (2016). URL: https://proceedings.spp-online.org/article/view/SPP-2016-2A-02.