Morphology of photolithography masks develop through electrostaticlithography process

Abstract

The morphology of photolithography masks develop through electrostatic- lithography process was investigated in this study. Substrate used includes transparent acetate film, mylar sheets and paper, while the smallest digital feature dimensions were 225, 100 and 25 μm. It was found out that the imprinted feature dimensions were larger than its digital source. The mean values of imprinted feature for 225 μm were from 275.54 ± 6.32 μm to 310.64 ± 4.12 μm, whereas the imprints of 100 μm were from 130.52 ± 3.96 μm to 168.86 ± 5.36 μm. Contaminations were also found out to increase as the feature dimension decreases.