Morphology of photolithography masks develop through electrostaticlithography process

Authors

Dominic P. Guaña ⋅ PH Physics Department, Ateneo De Manila University
Raphael A. Guerrero ⋅ PH Department of Physics, Ateneo de Manila University

Abstract

The morphology of photolithography masks develop through electrostatic- lithography process was investigated in this study. Substrate used includes transparent acetate film, mylar sheets and paper, while the smallest digital feature dimensions were 225, 100 and 25 μm. It was found out that the imprinted feature dimensions were larger than its digital source. The mean values of imprinted feature for 225 μm were from 275.54 ± 6.32 μm to 310.64 ± 4.12 μm, whereas the imprints of 100 μm were from 130.52 ± 3.96 μm to 168.86 ± 5.36 μm. Contaminations were also found out to increase as the feature dimension decreases.

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Issue

2016: Proceedings of the 34th Samahang Pisika ng Pilipinas Physics Conference

Physics at the front and center: Strengthening core values in physics research
18–21 August 2016, University of the Philippines Visayas, Iloilo City

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SPP2016 Partners and Sponsors

Article ID

SPP-2016-1B-04

Section

Condensed Matter Physics and Materials Science

Published

2016-08-18

How to Cite

[1]

DP Guaña and RA Guerrero, Morphology of photolithography masks develop through electrostaticlithography process, Proceedings of the Samahang Pisika ng Pilipinas 34, SPP-2016-1B-04 (2016). URL: https://proceedings.spp-online.org/article/view/SPP-2016-1B-04.