Fabrication of high aspect ratio grating using photolithography

Authors

Francesca Isabel N. de Vera ⋅ PH National Institute of Physics, University of the Philippines Diliman
Fritz B. Awitan ⋅ PH National Institute of Physics, University of the Philippines Diliman
Jonathan D. Azares ⋅ PH National Institute of Physics, University of the Philippines Diliman
Roland V. Sarmago ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

A simple method of fabricating an x-ray grating consisting of UV photolithography and electroplating technique was described in detail. The grating exhibit nearly straight vertical walls of alternating SU-8 photoresist and Au structures with sufficient aspect ratio to absorb xrays of up to 25KeV.

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Issue

2010: Proceedings of the 28th Samahang Pisika ng Pilipinas Physics Congress

Strengthening physics research and education for a brighter tomorrow
25-27 October 2010, MERALCO Management and Leadership Development Center, Antipolo City

Article ID

SPP-2010-PA-34

Section

Poster Session PA

Published

2010-10-25

How to Cite

[1]

FIN de Vera, FB Awitan, JD Azares, and RV Sarmago, Fabrication of high aspect ratio grating using photolithography, Proceedings of the Samahang Pisika ng Pilipinas 28, SPP-2010-PA-34 (2010). URL: https://proceedings.spp-online.org/article/view/SPP-2010-PA-34.