Fabrication of high aspect ratio grating using photolithography

Authors

  • Francesca Isabel N. de Vera ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Fritz B. Awitan ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Jonathan D. Azares ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Roland V. Sarmago ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

A simple method of fabricating an x-ray grating consisting of UV photolithography and electroplating technique was described in detail. The grating exhibit nearly straight vertical walls of alternating SU-8 photoresist and Au structures with sufficient aspect ratio to absorb xrays of up to 25KeV.

SPP 2010 Proceedings Cover

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Published

2010-10-25

Issue

2010: Proceedings of the 28th Samahang Pisika ng Pilipinas Physics Congress

Section

Poster Session PA

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How to Cite

[1]
FIN de Vera, FB Awitan, JD Azares, and RV Sarmago, Fabrication of high aspect ratio grating using photolithography, in Proceedings of the 28th Samahang Pisika ng Pilipinas Physics Congress (Philippines, 2010), SPP-2010-PA-34. URL: https://proceedings.spp-online.org/article/view/SPP-2010-PA-34
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