Growth mechanism of zinc oxide films by infrared pulsed laser deposition

Authors

Melvin John F. Empizo ⋅ PH National Institute of Physics, University of the Philippines Diliman
Jeffrey C. de Vero ⋅ PH National Institute of Physics, University of the Philippines Diliman
Wilson O. Garcia ⋅ PH National Institute of Physics, University of the Philippines Diliman
Roland V. Sarmago ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

The growth mechanism involved in the preparation of zinc oxide (ZnO) films by infrared pulsed laser deposition (IR PLD) was reported for the first time. ZnO films were prepared on glass substrates by IR PLD in vacuum without substrate heating. With the proposed growth mode, the film crystallinity and surface morphology depend on the deposition paramaters like deposition time and laser energy fluence.

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Issue

2010: Proceedings of the 28th Samahang Pisika ng Pilipinas Physics Congress

Strengthening physics research and education for a brighter tomorrow
25-27 October 2010, MERALCO Management and Leadership Development Center, Antipolo City

Article ID

SPP-2010-PA-24

Section

Poster Session PA

Published

2010-10-25

How to Cite

[1]

MJF Empizo, JC de Vero, WO Garcia, and RV Sarmago, Growth mechanism of zinc oxide films by infrared pulsed laser deposition, Proceedings of the Samahang Pisika ng Pilipinas 28, SPP-2010-PA-24 (2010). URL: https://proceedings.spp-online.org/article/view/SPP-2010-PA-24.