Characterization of extremely thick macroporous silicon layer synthesized via electrochemical etching

Authors

Rhona Olivia M. Gonzales ⋅ PH National Institute of Physics, University of the Philippines Diliman
Roma S. Lopez ⋅ PH Department of Physical Science, Polytechnic University of the Philippines
Jobelle J. Gimeno ⋅ PH Department of Physical Science, Polytechnic University of the Philippines
Ryan T. Diocampo ⋅ PH Department of Physical Science, Polytechnic University of the Philippines
Neil Irvin F. Cabello ⋅ PH National Institute of Physics, University of the Philippines Diliman
Arvin I. Mabilangan ⋅ PH National Institute of Physics, University of the Philippines Diliman
Rogelio G. Dizon ⋅ PH Department of Physical Science, Polytechnic University of the Philippines
Armando S. Somintac ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

Extremely thick macroporous silicon layers were fabricated from n-type silicon (100) wafers by electrochemical etching in ethanoic solution of hydrofluoric acid. At constant anodization time and electrolytic concentration the effects of current density variation on porous silicon formation were investigated using scanning electron microscopy (SEM), x-ray diffraction (XRD) and photoluminescence (PL).

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Published

2010-10-25

Issue

2010: Proceedings of the 28th Samahang Pisika ng Pilipinas Physics Congress

Section

Materials Physics

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How to Cite

[1]

“Characterization of extremely thick macroporous silicon layer synthesized via electrochemical etching”, Proc. SPP, vol. 28, no. 1, pp. SPP–2010, Oct. 2010, Accessed: Apr. 19, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP-2010-6B-02