Synthesis of titanium nitride coatings on titanium via magnetron sputtering in a magnetized sheet plasma source

Authors

Rommel Paulo Viloan National Institute of Physics, University of the Philippines Diliman
Leo Mendel Rosario National Institute of Physics, University of the Philippines Diliman and College of Arts, Sciences, and Education, FEATI University
Michelle Marie Villamayor National Institute of Physics, University of the Philippines Diliman
April Ulano National Institute of Physics, University of the Philippines Diliman
Beverly Anne Suarez National Institute of Physics, University of the Philippines Diliman
Henry J. Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

A magnetized sheet plasma source with a magnetron sputtering setup was used to perform nitriding on titanium substrates to synthesize titanium nitride (TiN) thin films. Results from X-ray diffraction analysis show that the TiN films exhibit stoichiometric (111), (200), and (220) phases. It was shown that synthesis of TiN can be done without target sputtering process and also without a Ti target during nitriding process. Visual inspections of the films show that gold color consistency is achieved at gas ratios of 1:3 and 1:1 and a target sputtering stage is necessary to produce gold-colored TiN film.

Downloads

Issue

2009: Proceedings of the 27th Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2009-PA-08

Section

Poster Session PA

Published

2009-10-28

How to Cite

[1]

RP Viloan, LM Rosario, MM Villamayor, A Ulano, BA Suarez, and HJ Ramos, Synthesis of titanium nitride coatings on titanium via magnetron sputtering in a magnetized sheet plasma source, Proceedings of the Samahang Pisika ng Pilipinas 27, SPP-2009-PA-08 (2009). URL: https://proceedings.spp-online.org/article/view/SPP-2009-PA-08.