Synthesis of titanium nitride coatings on titanium via magnetron sputtering in a magnetized sheet plasma source
Abstract
A magnetized sheet plasma source with a magnetron sputtering setup was used to perform nitriding on titanium substrates to synthesize titanium nitride (TiN) thin films. Results from X-ray diffraction analysis show that the TiN films exhibit stoichiometric (111), (200), and (220) phases. It was shown that synthesis of TiN can be done without target sputtering process and also without a Ti target during nitriding process. Visual inspections of the films show that gold color consistency is achieved at gas ratios of 1:3 and 1:1 and a target sputtering stage is necessary to produce gold-colored TiN film.