Strain effects on multiplexing selectivity of elastomer phase masks for volume holography

Authors

  • Juan Paolo S. Bermundo ⋅ PH Department of Physics, Ateneo de Manila University
  • Raphael A. Guerrero ⋅ PH Department of Physics, Ateneo de Manila University

Abstract

Strain versus selectivity behavior of a random phase elastomer phase mask is studied. Using the random phase elastomer phase mask, a minimum elongation of 0.072 mm is needed so that the reconstruction disappears and a new image can be stored. 13 unique holograms can be stored within 1 mm stretch of a random phase mask. We report that there is a negligible hysteretic effect on the mean pixel intensity for both elastomer phase masks.

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Issue

Article ID

SPP-2009-7A-01

Section

Optics and Plasma Physics

Published

2009-10-28

How to Cite

[1]
JPS Bermundo and RA Guerrero, Strain effects on multiplexing selectivity of elastomer phase masks for volume holography, Proceedings of the Samahang Pisika ng Pilipinas 27, SPP-2009-7A-01 (2009). URL: https://proceedings.spp-online.org/article/view/SPP-2009-7A-01.