Nanowire formation on (100)-oriented gallium antimonide substrates
Abstract
Gallium arsenide (GaAs) nanowires were formed on (100)-oriented gallium antimonide (GaSb) substrates through molecular beam epitaxy (MBE) using only elemental gallium and arsenic. Scanning Electron Microscopy (SEM) reveals nanowires that are 3.81-5.86 μm long with diameter in the range 458-900 nm. SEM also shows the nanowires originate from craters on the gallium arsenide surface.
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Article ID
SPP-2009-1B-05
Section
Nanomaterials
Published
2009-10-28
How to Cite
[1]
CP Sadia, EAP Prieto, JG Porquez, KM Omambac, AS Somintac, and AA Salvador, Nanowire formation on (100)-oriented gallium antimonide substrates, Proceedings of the Samahang Pisika ng Pilipinas 27, SPP-2009-1B-05 (2009). URL: https://proceedings.spp-online.org/article/view/SPP-2009-1B-05.