Hydrogen ion implantation of acrylamide-bis in gas discharge ion source plasma: Investigation of conductivity using FTIR analysis
Abstract
Acrylamide-bis was treated with hydrogen ion implantation thru a gas discharge ion source (GDIS). The samples were treated for 15 minutes at discharge currents of 2.5 mA, 3.0 mA, and 3.5 mA. Fourier transform infrared spectroscopy (FTIR) characterization was performed and results indicate stretching in the apparent bonds/peaks before and after treatment. Changes in the C-N and C-H bonds were also observed which causes electron deficiency in N. This deficiency suggests change in the materials' conductivity.
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