Hydrogen ion implantation of acrylamide-bis in gas discharge ion source plasma: Investigation of conductivity using FTIR analysis

Authors

Christian Lorenz S. Mahinay National Institute of Physics, University of the Philippines Diliman
Henry J. Ramos National Institute of Physics, University of the Philippines Diliman
Myrna Sillero-Mahinay Department of Chemistry, Mindanao State University – Iligan Institute of Technology

Abstract

Acrylamide-bis was treated with hydrogen ion implantation thru a gas discharge ion source (GDIS). The samples were treated for 15 minutes at discharge currents of 2.5 mA, 3.0 mA, and 3.5 mA. Fourier transform infrared spectroscopy (FTIR) characterization was performed and results indicate stretching in the apparent bonds/peaks before and after treatment. Changes in the C-N and C-H bonds were also observed which causes electron deficiency in N. This deficiency suggests change in the materials' conductivity.

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Issue

2008: Proceedings of the 26th Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2008-PA-42

Section

Poster Session A (Materials, Optical, and Plasma Physics)

Published

2008-10-22

How to Cite

[1]

CLS Mahinay, HJ Ramos, and M Sillero-Mahinay, Hydrogen ion implantation of acrylamide-bis in gas discharge ion source plasma: Investigation of conductivity using FTIR analysis, Proceedings of the Samahang Pisika ng Pilipinas 26, SPP-2008-PA-42 (2008). URL: https://proceedings.spp-online.org/article/view/SPP-2008-PA-42.