Enhanced TiN deposition rate in a magnetized sheet plasma source

Authors

Hamdi Muhyuddin D. Barra National Institute of Physics, University of the Philippines Diliman and Physics Department, Mindanao State University – Main Campus, Marawi City
Michelle Marie S. Villamayor National Institute of Physics, University of the Philippines Diliman
Henry J. Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

A magnetized sheet plasma of several millimeters is used in the synthesis of titanium nitride (TiN). Sm-Co permanent magnets were placed below the Ti target to increase the sputtering yield. The Ti target is biased from –250V to –350V and is sputtered by Ar plasma produced at discharge current of 2.5– 4A and discharge potential of 60–90V. Steel substrates of dimensions 20x20x0.5 mm³ were prepared with N₂:Ar volumetric ratios of 1:3, 1:5 and 1:10. Ocular inspection of samples exhibit bright gold color associated with TiN. XRD characterization showed that all samples exhibit the (200) and (311) peaks of TiN and the non-stoichiometric Ti₂N (220) facet. Deposition rate of TiN increased to ~0.35μm/min as shown in the cross-sectional SEM results. This doubles what was previously obtained. Scanning electron micrograph results give a comparative morphological picture of the samples. Vickers hardness results gave the largest hardness value of 20.094GPa.

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Issue

2008: Proceedings of the 26th Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2008-PA-01

Section

Poster Session A (Materials, Optical, and Plasma Physics)

Published

2008-10-22

How to Cite

[1]

HMD Barra, MMS Villamayor, and HJ Ramos, Enhanced TiN deposition rate in a magnetized sheet plasma source, Proceedings of the Samahang Pisika ng Pilipinas 26, SPP-2008-PA-01 (2008). URL: https://proceedings.spp-online.org/article/view/SPP-2008-PA-01.