Imaging of Si photodiode under different biasing conditions via optical feedback microscopy
Abstract
Imaging of Silicon (Si) photodiode under unbiased, reverse, and forward biased conditions using optical feedback microscopy was undertaken. Comparison on the responses of the different photodiode regions (pn-overlay, n-type, metal pad, and substrate) for a particular temperature and as the temperature is increased was done. Thermal gradient maps of the photodiode for the different biasing conditions are presented.
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Sustaining the gains of physics
25-27 October 2006, Ateneo de Davao University, Davao City