Imaging of Si photodiode under different biasing conditions via optical feedback microscopy
Abstract
Imaging of Silicon (Si) photodiode under unbiased, reverse, and forward biased conditions using optical feedback microscopy was undertaken. Comparison on the responses of the different photodiode regions (pn-overlay, n-type, metal pad, and substrate) for a particular temperature and as the temperature is increased was done. Thermal gradient maps of the photodiode for the different biasing conditions are presented.
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Article ID
SPP-2006-1A-01
Section
Instrumentation and Optics
Published
2006-10-25
How to Cite
[1]
VJ Cemine, CM Blanca, and C Saloma, Imaging of Si photodiode under different biasing conditions via optical feedback microscopy, Proceedings of the Samahang Pisika ng Pilipinas 24, SPP-2006-1A-01 (2006). URL: https://proceedings.spp-online.org/article/view/SPP-2006-1A-01.