Measurement of silicon dioxide thickness using reflectance spectrometer

Authors

Annabelle T. Corales Institute of Mathematical Sciences and Physics, University of the Philippines Los Baños
Marvin U. Herrera Institute of Mathematical Sciences and Physics, University of the Philippines Los Baños

Abstract

A reflectance spectrometer was modified to measure the reflectance of silicon dioxide thin film at different angles of incidence. Using Snell's Law and thin film thickness equation, the thickness of SiO₂ film was determined from the reflectance of the sample. The measured thickness was consistent with the SiO₂ Thickness Color Chart but with improved resolution.

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Issue

2003: Proceedings of the 21st Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2003-3E-04

Section

Instrumentation Physics

Published

2003-10-22

How to Cite

[1]

AT Corales and MU Herrera, Measurement of silicon dioxide thickness using reflectance spectrometer, Proceedings of the Samahang Pisika ng Pilipinas 21, SPP-2003-3E-04 (2003). URL: https://proceedings.spp-online.org/article/view/SPP-2003-3E-04.