Apertureless optical near-field fabrication using atomic force microscope on photoresists

Authors

Alvarado B. Tarun ⋅ PH National Institute of Physics, University of the Philippines Diliman
Marlon Rosendo Daza ⋅ PH National Institute of Physics, University of the Philippines Diliman
Norihiko Hayazawa ⋅ JP Department of Applied Physics, Osaka University
Yasushi Inouye ⋅ JP Department of Applied Physics, Osaka University
Satoshi Kawata ⋅ JP Department of Applied Physics, Osaka University

Abstract

We present an apertureless optical near-field fabrication using an atomic force microscope (AFM). With this technique, we can directly pattern 100 nm lines on positive photoresist spin-coated over a glass substrate. The nanostructure fabrication was carried out by the field enhancement (FE) generated at the tip apex of an apertureless probe illuminated with a 403 nm laser light. A decrease in the linewidth of the fabricated lines was observed with decreasing energy dose. No undesirable exposure was observed before development.

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Issue

2001: Proceedings of the 19th Samahang Pisika ng Pilipinas Philippine Physics Congress

Scaling new heights in physics and physics education
24-26 October 2001, Saint Mary's University, Nueva Vizcaya

Article ID

SPP-2001-H2A-2

Section

Optics and Microscopy

Published

2001-10-24

How to Cite

[1]

AB Tarun, MR Daza, N Hayazawa, Y Inouye, and S Kawata, Apertureless optical near-field fabrication using atomic force microscope on photoresists, Proceedings of the Samahang Pisika ng Pilipinas 19, SPP-2001-H2A-2 (2001). URL: https://proceedings.spp-online.org/article/view/SPP-2001-H2A-2.