Apertureless optical near-field fabrication using atomic force microscope on photoresists
Abstract
We present an apertureless optical near-field fabrication using an atomic force microscope (AFM). With this technique, we can directly pattern 100 nm lines on positive photoresist spin-coated over a glass substrate. The nanostructure fabrication was carried out by the field enhancement (FE) generated at the tip apex of an apertureless probe illuminated with a 403 nm laser light. A decrease in the linewidth of the fabricated lines was observed with decreasing energy dose. No undesirable exposure was observed before development.
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