Pulsed laser deposition of titanium on silicon in a N₂ environment

Authors

Jose Omar S. Amistoso ⋅ PH National Institute of Physics, University of the Philippines Diliman
Edgardo L. Pabit ⋅ PH National Institute of Physics, University of the Philippines Diliman
Marilyn Sheryl A. Hui ⋅ PH National Institute of Physics, University of the Philippines Diliman
Wilson O. Garcia ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

In this communication, we report the fabrication of titanium nitride thin film on silicon substrate through pulsed laser deposition (PLD). A pulsed Nd-YAG laser is used to ablate a Ti target in a nitrogen environment to deposit a TiN film on silicon. The effects of the different deposition parameters on the film quality are studied.

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Issue

1999: Proceedings of the 17th National Physics Congress of the Samahang Pisika ng Pilipinas

Article ID

SPP-1999-MS-01

Section

Materials Science

Published

1999-10-22

How to Cite

[1]

JOS Amistoso, EL Pabit, MSA Hui, and WO Garcia, Pulsed laser deposition of titanium on silicon in a N2 environment, Proceedings of the Samahang Pisika ng Pilipinas 17, SPP-1999-MS-01 (1999). URL: https://proceedings.spp-online.org/article/view/SPP-1999-MS-01.