Pulsed laser deposition of titanium on silicon in a N2 environment
Abstract
In this communication, we report the fabrication of titanium nitride thin film on silicon substrate through pulsed laser deposition (PLD). A pulsed Nd-YAG laser is used to ablate a Ti target in a nitrogen environment to deposit a TiN film on silicon. The effects of the different deposition parameters on the film quality are studied.
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Building and sustaining a tradition for the 21st Century
22-24 October 1999, Leyte Normal University, Tacloban City