Modified configuration of TiN film deposited on stainless steel substrate using magnetized sheet plasma source

Authors

Ar Jay C. Sura National Institute of Physics, University of the Philippines Diliman
Hamdy Abdel Moneim Abdou National Institute of Physics, University of the Philippines Diliman
Erwin Abergas Asian Semiconductor and Electronics Technology, Department of Science and Technology
Marcedon S. Fernandez National Institute of Physics, University of the Philippines Diliman
Henry J. Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

Deposition of TiN film on washer stainless steel type 304 was done using magnetized sheet plasma negative ion source. A modified configuration of substrate, target and magnets was used. XRD results showed that coated substrate exhibited TiN(200), Ti₂N(220), TiN(220) and TiN(311) XRD peaks. Cross-sectional SEM results showed the TiN film thickness of 78.05 m and deposition rate of 0.65m/min. Surface energy analysis of the substrates was also done using contact angle measurement. Results showed that TiN deposit increased the hydrophobicity and decreased the surface energy of the stainless steel.

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Issue

2015: Proceedings of the 33rd Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2015-PB-30

Section

Poster Session PB

Published

2015-06-03

How to Cite

[1]

AJC Sura, HAM Abdou, E Abergas, MS Fernandez, and HJ Ramos, Modified configuration of TiN film deposited on stainless steel substrate using magnetized sheet plasma source, Proceedings of the Samahang Pisika ng Pilipinas 33, SPP-2015-PB-30 (2015). URL: https://proceedings.spp-online.org/article/view/1236.