Influence of ultrathin films on the terahertz emission of germanium
Abstract
We report on the influence of ultrathin films of silicon nitride (Si3N4) and diamond-like carbon (DLC) on the terahertz (THz) emission of germanium (Ge) excited by femtosecond optical pulses. The peak-to peak amplitude of the THz field intensity was found to increase by 2.92 and 2.51 times for Ge with Si3N4 and DLC, respectively, with low-frequency photoexcited carriers dominating the THz emission. We attribute the enhancement to the emergence of a significant strain field at the Ge-film interface.