Thin film sputtering deposition of MAX phase Ti₃SiC₂ on polycarbonate substrate using methane as a carbon source

Authors

Arjay Sura ⋅ PH Department of Physical Sciences, College of Science
Hamdi Muhyuddin Barra ⋅ PH Physics Department, Mindanao State University, Marawi City
Rommel Paulo Viloan ⋅ PH National Institute of Physics, University of the Philippines Diliman
Michelle Marie Villamayor ⋅ PH National Institute of Physics, University of the Philippines Diliman
Henry Ramos ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

Thin film deposition of MAX phase Ti₃SiC₂ on polycarbonate substrate was done using the magnetized sheet plasma negative ion source facility via reactive sputtering deposition. Titanium and silicon targets were co-deposited onto polycarbonate substrate together with carbon by breaking down the CH₄ gas introduced in the ion source. The varied parameter in this study was the ratio of CH₄:Ar. The synthesized thin films were characterized using XRD spectroscopy, FTIR-ATR and contact angle measurement. XRD patterns of the deposited films showed the formation of Ti₃SiC₂ (105) and (1013), Ti₅Si₃ and TiC (111) phases.

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Issue

2013: Proceedings of the 31st Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP2013-PA-31

Section

Poster Session PA

Published

2013-10-23

How to Cite

[1]

A Sura, HM Barra, RP Viloan, MM Villamayor, and H Ramos, Thin film sputtering deposition of MAX phase Ti3SiC2 on polycarbonate substrate using methane as a carbon source, Proceedings of the Samahang Pisika ng Pilipinas 31, SPP2013-PA-31 (2013). URL: https://proceedings.spp-online.org/article/view/SPP2013-PA-31.