Development of Aluminum Nitride thin film as a pH-sensor
Abstract
Aluminum nitride (AlN) thin films were grown on Silicon (100) substrates with SiO2 layer and were fabricated for pH-sensing applications. The response of the AlN thin film in terms of change in the resistance with respect to the pH of buffer solution was observed. It was observed that for acidic solutions, the resistance decreases and for basic solutions, the resistance increases. It was shown that AlN films are sensitive to a wide range of pH values. XRD analysis was done to verify the presence of AlN thin films and the hexagonal wurtzite structure of the deposited thin films.