Implementation of converging ion beam to prepare functional thin film materials
Abstract
Possible improvements in plasma based syntheses of functional thin film materials for various applications are possible based upon the technology transfer of convergent ion beam developed for nuclear fusion plasma research. The intense ion beam current with the current density exceeding 600 mA/cm2 and the energy lower than 20 keV provide an ideal particle source to sputter out materials necessary for thin film syntheses. Comparison with the sputtering yield data suggests operation of the source with Ne and Ar can create enough Ti flux based upon beam sputter deposition.
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