Implementation of converging ion beam to prepare functional thin film materials

Authors

Mamiko Sasao ⋅ JP Office for R&D promotion, Doshisha University
Takahiro Kenmotsu ⋅ JP Faculty of Life and Medical Sciences, Doshisha University
Naoki Miyamoto ⋅ JP Graduate School of Science and Engineering, Doshisha University
Masaki Nishiura ⋅ JP National Institute for Fusion Science
Henry Ramos ⋅ PH National Institute of Physics, University of the Philippines Diliman
Motoi Wada ⋅ JP Graduate School of Science and Engineering, Doshisha University

Abstract

Possible improvements in plasma based syntheses of functional thin film materials for various applications are possible based upon the technology transfer of convergent ion beam developed for nuclear fusion plasma research. The intense ion beam current with the current density exceeding 600 mA/cm2 and the energy lower than 20 keV provide an ideal particle source to sputter out materials necessary for thin film syntheses. Comparison with the sputtering yield data suggests operation of the source with Ne and Ar can create enough Ti flux based upon beam sputter deposition.

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Issue

2013: Proceedings of the 31st Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP2013-5C-1

Section

Plasma Physics

Published

2013-10-23

How to Cite

[1]

M Sasao, T Kenmotsu, N Miyamoto, M Nishiura, H Ramos, and M Wada, Implementation of converging ion beam to prepare functional thin film materials, Proceedings of the Samahang Pisika ng Pilipinas 31, SPP2013-5C-1 (2013). URL: https://proceedings.spp-online.org/article/view/SPP2013-5C-1.