Surface topographical properties of Nd

YAG thin films on silicon (111) substrate grown by femtosecond pulsed laser deposition

Authors

  • Arriane P. Lacaba National Institute of Physics, University of the Philippines Diliman
  • Wilson O. Garcia National Institute of Physics, University of the Philippines Diliman

Abstract

Nd:YAG thin films on silicon (111) substrate fabricated by femtosecond pulsed laser deposition was investigated. In-situ and post- deposition substrate heating was applied to the deposited thin films. Surface topographical properties were determined using atomic force microscopy and image analysis. AFM images showed that substrate heating affects the RMS surface roughness of the thin films. It was revealed that particle size distribution narrowed with high substrate temperature. Variation in the average particle size showed dependence on the type of substrate heating.

Downloads

Issue

Article ID

SPP2013-5A-1

Section

Materials Science

Published

2013-10-23

How to Cite

[1]
AP Lacaba and WO Garcia, Surface topographical properties of Nd: YAG thin films on silicon (111) substrate grown by femtosecond pulsed laser deposition, Proceedings of the Samahang Pisika ng Pilipinas 31, SPP2013-5A-1 (2013). URL: https://proceedings.spp-online.org/article/view/SPP2013-5A-1.