Surface topographical properties of Nd
YAG thin films on silicon (111) substrate grown by femtosecond pulsed laser deposition
Abstract
Nd:YAG thin films on silicon (111) substrate fabricated by femtosecond pulsed laser deposition was investigated. In-situ and post- deposition substrate heating was applied to the deposited thin films. Surface topographical properties were determined using atomic force microscopy and image analysis. AFM images showed that substrate heating affects the RMS surface roughness of the thin films. It was revealed that particle size distribution narrowed with high substrate temperature. Variation in the average particle size showed dependence on the type of substrate heating.