Structural and morphological characterization of femtosecond pulsed laser deposited Er:YAG on silicon substrate
Abstract
We report initial studies in the characterization of the deposited Er:YAG on Silicon(100) substrate by Pulsed Laser Deposition using a femtosecond Ti:Sapphire laser. The parameter investigated was deposition time varied from 2 hours, 3 hours and 4 hours. XRD spectra of the 3-hour and 4-hour deposited films revealed thin film growth on the substrate but the 3-hour deposited film showed better crystalline structure with the YAG (444) as the highly prominent peak. Conversely, no significant peaks were observed in the 2-hour deposited sample. AFM topographical images of the films showed that further increase of deposition time results to larger particles. The 3-hour and 4hour deposited films revealed nanostructures with sizes ranging up to 200 nm and 600 nm respectively.