Production of nano-crystalline diamond film by chemical sputtering in ECR microwave plasma

Abstract

Plasma enhanced chemical vapor deposition (PECVD) of nano-crystalline diamond film had been realized by supplying only hydrogen gas into a plasma under an electron cyclotron resonance (ECR) condition. Plasma sputtering of carbon target has created enough amount of hydrocarbon (CH) flux necessary to form the film onto a silicon substrate. Mass spectrum analysis at the downstream region has shown an enhanced production of CH radicals during ECR plasma discharge. Meanwhile, increased hydrogen pressure during plasma operation has increased the grain size and density of nano-crystalline diamond.