Production of nano-crystalline diamond film by chemical sputtering in ECR microwave plasma

Authors

  • Camille Faith Romero Graduate School of Science and Engineering, Doshisha University Kyotanabe
  • Masaru Yamanaka Graduate School of Science and Engineering, Doshisha University
  • Motoi Wada Graduate School of Science and Engineering, Doshisha University

Abstract

Plasma enhanced chemical vapor deposition (PECVD) of nano-crystalline diamond film had been realized by supplying only hydrogen gas into a plasma under an electron cyclotron resonance (ECR) condition. Plasma sputtering of carbon target has created enough amount of hydrocarbon (CH) flux necessary to form the film onto a silicon substrate. Mass spectrum analysis at the downstream region has shown an enhanced production of CH radicals during ECR plasma discharge. Meanwhile, increased hydrogen pressure during plasma operation has increased the grain size and density of nano-crystalline diamond.

Downloads

Issue

Article ID

SPP2013-1C-6

Section

Plasma Physics

Published

2013-10-23

How to Cite

[1]
CF Romero, M Yamanaka, and M Wada, Production of nano-crystalline diamond film by chemical sputtering in ECR microwave plasma, Proceedings of the Samahang Pisika ng Pilipinas 31, SPP2013-1C-6 (2013). URL: https://proceedings.spp-online.org/article/view/SPP2013-1C-6.