Monitoring the Presence of Cu₂O and CuO during thermal oxidation of copper thin film via In Situ measurement of transmittance

Authors

Jennifer Damasco Ty ⋅ PH National Institute of Physics, University of the Philippines Diliman
Marianne Lorene Macailing ⋅ PH National Institute of Physics, University of the Philippines Diliman
Ivan Culaba ⋅ PH Department of Physics, Ateneo de Manila University
Roland Sarmago ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

The formation of Cu₂O and CuO from thermally oxidizing a copper thin film deposited on a glass substrate is monitored by looking at the transmittance when a 633 nm laser light is incident on the copper thin film during oxidation. Transmittance increases initially and then plateaus for samples oxidized at a maximum temperature of 204°C, indicating the formation of Cu₂O. Transmittance increases initially and then gradually declines for samples oxidized at a maximum temperature of 378°C, indicating the formation of CuO. The films have been characterized using SEM, EDX, and UV/Vis analysis.

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Published

2011-10-24

Issue

2011: Proceedings of the 29th Samahang Pisika ng Pilipinas National Physics Congress

Section

Condensed Matter and Materials Physics

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How to Cite

[1]

Monitoring the Presence of Cu2O and CuO during thermal oxidation of copper thin film via In Situ measurement of transmittance, Proceedings of the Samahang Pisika ng Pilipinas 29, (2011). URL: https://proceedings.spp-online.org/article/view/SPP2011-6C-4.