Monitoring the Presence of Cu2O and CuO during thermal oxidation of copper thin film via In Situ measurement of transmittance

Authors

  • Jennifer Damasco Ty ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Marianne Lorene Macailing ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Ivan Culaba ⋅ PH Department of Physics, Ateneo de Manila University
  • Roland Sarmago ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

The formation of Cu2O and CuO from thermally oxidizing a copper thin film deposited on a glass substrate is monitored by looking at the transmittance when a 633 nm laser light is incident on the copper thin film during oxidation. Transmittance increases initially and then plateaus for samples oxidized at a maximum temperature of 204°C, indicating the formation of Cu2O. Transmittance increases initially and then gradually declines for samples oxidized at a maximum temperature of 378°C, indicating the formation of CuO. The films have been characterized using SEM, EDX, and UV/Vis analysis.

SPP2011 Conference Proceedings Cover

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Published

2011-10-24

Issue

2011: Proceedings of the 29th Samahang Pisika ng Pilipinas National Physics Congress

Section

Condensed Matter and Materials Physics

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How to Cite

[1]
“Monitoring the Presence of Cu2O and CuO during thermal oxidation of copper thin film via In Situ measurement of transmittance”, Proc. SPP, vol. 29, no. 1, pp. SPP2011–6C, Oct. 2011, Accessed: Apr. 06, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP2011-6C-4