Monitoring the Presence of Cu2O and CuO during thermal oxidation of copper thin film via In Situ measurement of transmittance
Abstract
The formation of Cu2O and CuO from thermally oxidizing a copper thin film deposited on a glass substrate is monitored by looking at the transmittance when a 633 nm laser light is incident on the copper thin film during oxidation. Transmittance increases initially and then plateaus for samples oxidized at a maximum temperature of 204°C, indicating the formation of Cu2O. Transmittance increases initially and then gradually declines for samples oxidized at a maximum temperature of 378°C, indicating the formation of CuO. The films have been characterized using SEM, EDX, and UV/Vis analysis.
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Celebrating new ideas in physics
24-26 October 2011, University of the Philippines Diliman, Quezon City