Characterization of unannealed and annealed LTG:GaAs grown on SI-GaAs substrate for THz applications
Abstract
Characterization of low-temperature-grown Gallium Arsenide (LTG:GaAs) grown on semi-insulating (SI) GaAs substrate via molecular beam epitaxy (MBE) was presented. The substrate temperatures (Ts) considered were 220°C, 270°C and 310°C. High resolution x-ray diffraction showed that the LTG:GaAs was compressively strained with the SI-GaAs substrate. Raman spectroscopy confirmed the difference in the lattice constant of the LTG:GaAs epilayer and the SI-GaAs substrate. Upon in-situ annealing at temperature of 550°C for 5 minutes, the lattice parameter of the LTG:GaAs approached the conventional GaAs value. Terahertz (THz)-time domain spectroscopy revealed that annealed LTG:GaAs emits higher THz signal than unannealed LTG:GaAs. The increase in the THz amplitude was attributed to the increase in the surface depletion field of annealed LTG:GaAs caused by Fermi level pinning. Annealed LTG:GaAs grown at Ts=310°C emitted the highest THz radiation.