Determining the Slit Dimensions of a Double-Slit Aperture through Measuring Laser Diffraction Intensity with a Light-Dependent Resistor

Abstract

This paper demonstrates the possibility of measuring the intensity distribution of diffracted light using a light-dependent resistor. The resistor is first calibrated with respect to the light source, and the intensity of a diffraction pattern of a double-slit aperture is measured to create the intensity distribution. The primary and secondary minima of the intensity distribution are then used to calculate the width of the slits and the distance between the slits in the aperture, and these calculated values are compared to the dimensions of the slit. We find that the calculated values are highly accurate for the distance between the slits, but less accurate for the width of the slits.