Direct simulation Monte Carlo modeling of eclipsed pulsed laser deposition using grid mesh-type masks

Abstract

We model and investigate the effects of using grid mesh-type masks on the thickness distribution of films fabricated using pulsed laser deposition. Copper plasma plume expansion in argon background gas is simulated in 2D using the direct simulation Monte Carlo (DSMC) method. Grid masks were modeled using reflecting surfaces and various grid spacing and thread size were considered. Thickness distribution plots confirmed the decrease in deposition rate upon the introduction of the mask. Moreover, the thread-centered grid masks and combined grid masks significantly distort the thickness distribution. The roughness values also agree well with the thickness distributions. These preliminary results confirm the feasibility of using DSMC in modeling the plume expansion through complex obstructions, aiding the development of complex deposition geometries and configurations that yield uniform films over large substrates.