Terahertz emission from AlN/SI-GaAs heterostructure investigated using transmission-geometry terahertz time-domain spectroscopy
Abstract
We report a 900% terahertz (THz) emission enhancement and a 46.67% bandwidth gain from the bare SI-GaAs substrate to the AlN/SI-GaAs heterostructure fabricated via Radio Frequency (RF) Magnetron Sputtering. Parametric pump power measurements also showed a significant increase in the substrate’s optical-to-THz conversion efficiency due to the deposited AlN film. These results demonstrate the better performance of AlN/SI-GaAs as a prospective THz emitter than the bare substrate. The study focused on the effect of AlN thickness, sample reflectivity, and pump power on the THz radiation amplitude using Scanning Electron Microscopy (SEM), reflectivity measurements, and transmission-geometry THz- Time Domain Spectroscopy (TDS), respectively. The THz emission enhancement was then attributed to the band bending and optical cavity effect.
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