Effect of sputtering gas ratio and post-annealing parameters on AlN thin films deposited via low power RF magnetron sputtering

Authors

  • Roni Andig National Institute of Physics, University of the Philippines Diliman
  • Mae Agatha Tumanguil Materials Science and Engineering Program, University of the Philippines Diliman
  • John Paul Ferrolino Materials Science and Engineering Program, University of the Philippines Diliman
  • Earl Conan Casalme Materials Science and Engineering Program, University of the Philippines Diliman
  • Joy Kristelle De Mata Materials Science and Engineering Program, University of the Philippines Diliman
  • Arnel Salvador National Institute of Physics, University of the Philippines Diliman

Abstract

This work explores the deposition of aluminum nitride (AlN) using a low-power RF magnetron sputtering system. The X-ray diffraction analysis (XRD) pattern of the fabricated sample shows peaks representing AlN (001) and (002) crystal orientation at 33.25° and 36.09°. There was a noticeable peak shift when the samples were annealed to 1000°C owing to a more crystalline sample. However, the deposited thin films still have low crystallinity and the parameters used can still be further optimized.

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Published

2023-07-14

Issue

2023: Proceedings of the 41st Samahang Pisika ng Pilipinas Physics Conference

Section

Poster Session A (Materials Science, Instrumentation, and Photonics)

License

By submitting their manuscript to the Samahang Pisika ng Pilipinas (SPP) for consideration, the Authors warrant that their work is original, does not infringe on existing copyrights, and is not under active consideration for publication elsewhere.
Upon acceptance of their manuscript, the Authors further agree to grant SPP the non-exclusive, worldwide, and royalty-free rights to record, edit, copy, reproduce, publish, distribute, and use all or part of the manuscript for any purpose, in any media now existing or developed in the future, either individually or as part of a collection.
All other associated economic and moral rights as granted by the Intellectual Property Code of the Philippines are maintained by the Authors.

How to Cite

[1]
“ Effect of sputtering gas ratio and post-annealing parameters on AlN thin films deposited via low power RF magnetron sputtering”, Proc. SPP, vol. 41, no. 1, p. SPP-2023-PA-34, Jul. 2023, Accessed: Mar. 25, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP-2023-PA-34