Fourier transform infrared spectoscopy of Nd:YAG thin films by fs-PLD with nitrogen and oxygen as background gas
Nd:YAG is a synthetic laser crystal that possesses favorable properties such as high optical transparency in this study. Nd:YAG thin film was deposited on a glass substrate using a femtosecond pulsed laser deposition technique under the influence of nitrogen and oxygen background gases. The target to substrate distance was 2 mm. The deposition was conducted with background pressures of 50 and 80 mTorr. Deposited films were characterized using FTIR. Film deposited under the influence of oxygen yielded lower transmittance which could be due to increase surface roughness. Interaction between ablated materials and oxygen resulted to sputtering. The increase of nitrogen gas pressure also produced a rougher film, hence, lower transmittance.