Thickness calculations of thin films prepared by pulsed laser deposition on revolved and rotated substrates

Authors

Rommil Bacurin Emperado National Institute of Physics, University of the Philippines Diliman
Myles Allen H Zosa Institute of Laser Engineering, Osaka University
Lean L Dasallas Materials Science and Engineering Program, College of Science, University of the Philippines Diliman
Wilson O Garcia National Institute of Physics, University of the Philippines Diliman

Abstract

We present a modified model of film thickness from pulsed laser deposition on tilted substrates. A substrate rotated in front of the plume and a substrate revolved around the target are considered. The model is based on coordinate system transformations mapping projections of flux onto tilted substrates. Thickness profiles for the revolved substrate varies more rapidly with angle compared to the rotated substrate. Average thickness increases with angle for the rotated system and decreases for the revolved system. This behavior is expected for a strongly-forward plume expansion. Calculated roughness tends to decrease for both geometries for angles above 10^o.

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Issue

2020: Proceedings of the 38th Samahang Pisika ng Pilipinas Physics Conference

Article ID

SPP-2020-2C-03

Section

Condensed Matter Physics and Materials Science

Published

2020-10-19

How to Cite

[1]

RB Emperado, MAH Zosa, LL Dasallas, and WO Garcia, Thickness calculations of thin films prepared by pulsed laser deposition on revolved and rotated substrates, Proceedings of the Samahang Pisika ng Pilipinas 38, SPP-2020-2C-03 (2020). URL: https://proceedings.spp-online.org/article/view/SPP-2020-2C-03.