Effect of annealing temperature on transfer process of graphene

Abstract

Chemical vapor deposited graphene on copper foil is transferred on SiO₂/Si substrate by using soft paraffin as a support material during removal of copper catalyst. Upon catalyst removal the soft paraffin on graphene system was air annealed at different temperatures to test for improvement in the quality of graphene transferred onto a substrate. The soft paraffin on graphene was then scooped using the target substrate, placed in rough vacuum conditions, and was lastly exposed in n-hexane to dissolve the soft paraffin. Raman spectroscopy was used to confirm the deposition of graphene on the substrate and qualify the deposited graphene. A successful graphene transfer was done for annealing temperatures less than 50°C.