Parallel optical stereolithography using wavefront engineered light

Authors

  • Bernalyn Decena Electrical and Electronics Engineering Institute, University of the Philippines Diliman
  • Paul Leonard Hilario Electrical and Electronics Engineering Institute, University of the Philippines Diliman
  • Giovanni Tapang National Institute of Physics, University of the Philippines Diliman

Abstract

We perform single shot single-photon optical stereolithography using wavefront engineered light. We implement an extended version of the Gerchberg-Saxton algorithm to precalculate the phase-only hologram used in the reconstructions of the target pattern. We then project the holographic reconstruction on a photopolymerizable resin. A resolution of 8.3 µm and pitch of 15 µm shows that we are able to photopolymerized high resolution and high fidelity microstructures using the technique.

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Published

2018-05-26

How to Cite

[1]
B Decena, PL Hilario, and G Tapang, Parallel optical stereolithography using wavefront engineered light, Proceedings of the Samahang Pisika ng Pilipinas 36, SPP-2018-2D-05 (2018). URL: https://proceedings.spp-online.org/article/view/SPP-2018-2D-05.