Parallel optical stereolithography using wavefront engineered light

Abstract

We perform single shot single-photon optical stereolithography using wavefront engineered light. We implement an extended version of the Gerchberg-Saxton algorithm to precalculate the phase-only hologram used in the reconstructions of the target pattern. We then project the holographic reconstruction on a photopolymerizable resin. A resolution of 8.3 µm and pitch of 15 µm shows that we are able to photopolymerized high resolution and high fidelity microstructures using the technique.