Estimation of refractive index for thin film aluminum nitride on quartz substrates using envelope method

Authors

  • Nemesio Mangila National Institute of Physics, University of the Philippines Diliman
  • Celestino Andrew Borja National Institute of Physics, University of the Philippines Diliman
  • Oliver Semblante Cebu Technological University
  • Claude Ceniza National Institute of Physics, University of the Philippines Diliman
  • Arnel A. Salvador National Institute of Physics, University of the Philippines Diliman
  • Armando S. Somintac National Institute of Physics, University of the Philippines Diliman

Abstract

Aluminum Nitride (AlN) films were deposited using Reactive RF Magnetron Sputtering with thicknesses of 0.86 µm and 1.26µm on quartz substrates. The AlN films were deposited using total gas pressure of 8x10-3mbar, with 1:3 Ar-N2 partial pressure ratio. The films were highly transparent in the visible region (380-750nm) and exhibited strong absorption in the UV range (200-300nm). From the optical transmission profiles, the refractive indexes of the thin films were computed. For the 0.86µm the estimated refractive index ranges from 1.5-1.64 and 1.26µm AlN ranges from 1.4-1.64.

SPP 2010 Proceedings Cover

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Published

2010-10-25

Issue

2010: Proceedings of the 28th Samahang Pisika ng Pilipinas Physics Congress

Section

Poster Session PA

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All other associated economic and moral rights as granted by the Intellectual Property Code of the Philippines are maintained by the Authors.

How to Cite

[1]
“Estimation of refractive index for thin film aluminum nitride on quartz substrates using envelope method”, Proc. SPP, vol. 28, no. 1, p. SPP-2010-PA-44, Oct. 2010, Accessed: Mar. 31, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP-2010-PA-44