Surface morphology of IR-PLD grown Bi₂Sr₂CaCu₂O8+δ thin films etched by hydrochloric acid (HCl) solution
Abstract
We report on the effect of using chemical etchant on the surface morphology of superconducting Bi-2212 films grown by IR-PLD. Wet chemical etching was employed via immersion of the samples on diluted solutions of hydrochloric acid (HCl) in order to define a bowtie structure prepared via standard photolithography. Other etchants such as phosphoric acid (H₃PO₄), and potassium chloride (KCl) were also used. Surface morphology of the samples was then observed after the process. Significant etching was observed on HCl immersed sample as compared to samples immersed in H₃PO₄, and KCl. However prolonged etching in HCl resulted to deterioration in the surface morphology of the samples.