Suppression of carrier thermalization in quantum dots through tensile strain
Abstract
Bimodal size distribution InAs quantum dots (QDs) grown on a native GaAs substrate are strained through epitaxial lift off (ELO) techniques. The epilayer containing the QDs is bonded on MgO and Si substrates. The ELO film is subjected to low temperatures experiencing either compressive (on MgO) or tensile (on Si) strain due to difference in thermal expansion coefficients of the substrates. With increasing tensile strain, the photoluminescence spectra show intensity enhancement in small QD optical transitions and suppression in large QD transitions. This is attributed to increased carrier confinement for tensile strained QDs which effectively suppresses carrier thermalization in small QDs.
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