Single-photon photopolymerization dynamics under broadband excitation

Abstract

We present a numerical simulation of photopolymerization under broadband excitation. We simulate the photopolymerization of a point by computing the point spread function (PSF) of the optical system using the solution given by Richards and Wolf. The degree of photopolymerization is determined by decrease in the concentration of the photoinitiator of the photoresist. Using this method, we investigated the growth of a voxel with respect to time. We simulate optical lithography of a structure by convolving the PSF with a two-dimensional pixel of the target  structure. Using this technique we are able to simulate the transverse and axial growth of the pixel.