Fabrication of gratings with varying photo resist and polyimide by photolithography for X-ray transmission
Abstract
This paper gives a detailed description and comparison between the combination of different photo resists and polyimide (AZ5214E and Hi-PR6010 and Durimide 7510) for photolithographic process in fabricating diffraction gratings. The methods used for grating fabrications are photolithography, which involves spin coating, UV exposure and development, and metal deposition via thermal evaporation and electroplating. Sample preparation for cross sectional viewing was also discussed. Structural images are shown and evaluated for each technique.
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