Fabrication of gratings with varying photo resist and polyimide by photolithography for X-ray transmission

Authors

Francesca Isabel N. de Vera National Institute of Physics, University of the Philippines Diliman
Myles Allen H. Zosa National Institute of Physics, University of the Philippines Diliman
Jennifer Anne S. Constantino National Institute of Physics, University of the Philippines Diliman
Roland V. Sarmago National Institute of Physics, University of the Philippines Diliman

Abstract

This paper gives a detailed description and comparison between the combination of different photo resists and polyimide (AZ5214E and Hi-PR6010 and Durimide 7510) for photolithographic process in fabricating diffraction gratings. The methods used for grating fabrications are photolithography, which involves spin coating, UV exposure and development, and metal deposition via thermal evaporation and electroplating. Sample preparation for cross sectional viewing was also discussed. Structural images are shown and evaluated for each technique.

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Issue

2009: Proceedings of the 27th Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2009-PA-42

Section

Poster Session PA

Published

2009-10-28

How to Cite

[1]

FIN de Vera, MAH Zosa, JAS Constantino, and RV Sarmago, Fabrication of gratings with varying photo resist and polyimide by photolithography for X-ray transmission, Proceedings of the Samahang Pisika ng Pilipinas 27, SPP-2009-PA-42 (2009). URL: https://proceedings.spp-online.org/article/view/SPP-2009-PA-42.