Optimization of anodization parameters for the synthesis of anodic aluminum oxide (AAO) on silicon substrate
Abstract
Anodic Aluminum Oxide (AAO) from thin film aluminum sputtered on silicon substrate was synthesized using the two-step anodization process using oxalic acid solution. Both the pore diameter and interpore spacing increases with increasing applied voltage. Least deviation for these parameters was noted at 40 V while a temperature of 5°C of the anodizing solution showed the smallest deviation for interpore spacing. Scanning electron microscope (SEM) was used to image the surface morphology of AAO at different parameters.