Optimization results of argon ion trajectory simulations for different magnetron sputtering configurations

Authors

  • Henry V. Lee National Institute of Physics, University of the Philippines Diliman
  • Leo Mendel D. Rosario National Institute of Physics, University of the Philippines Diliman and College of Arts, Sciences, and Education, FEATI University
  • Rommel Paulo B. Viloan National Institute of Physics, University of the Philippines Diliman
  • Michelle Villamayor National Institute of Physics, University of the Philippines Diliman
  • Roy B. Tumlos National Institute of Physics, University of the Philippines Diliman and Department of Physical Sciences and Mathematics, University of the Philippines Manila
  • Henry J. Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

Experiments on the magnetized sheet plasma source show that the addition of a magnetron sputtering configuration instead of a previous deposition setup increases the deposition rate of titanium nitride by fivefold compared to a previous orientation of magnets under the titanium target. In order to investigate the effects of the electric and magnetic fields in the thin film deposition process, the argon ion trajectories of different target bias voltages and magnet orientations are simulated using the Boris leapfrog algorithm. It is found that the presence of magnetic cusp field near the titanium target, coupled with a large negative bias, results to effectively guiding the argon ions towards the target, resulting to increased film deposition rates.

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Article ID

SPP-2009-7B-02

Section

Optics and Numerical Modeling

Published

2009-10-28

How to Cite

[1]
HV Lee, LMD Rosario, RPB Viloan, M Villamayor, RB Tumlos, and HJ Ramos, Optimization results of argon ion trajectory simulations for different magnetron sputtering configurations, Proceedings of the Samahang Pisika ng Pilipinas 27, SPP-2009-7B-02 (2009). URL: https://proceedings.spp-online.org/article/view/SPP-2009-7B-02.