Si₃N₄ synthesis using a magnetized sheet plasma negative ion source

Authors

April M. Ulano ⋅ PH National Institute of Physics, University of the Philippines Diliman
Giovanni Malapit ⋅ PH National Institute of Physics, University of the Philippines Diliman and Department of Physical Sciences, University of the Philippines Baguio
Rommel Paulo B. Viloan ⋅ PH National Institute of Physics, University of the Philippines Diliman
Michelle Villamayor ⋅ PH National Institute of Physics, University of the Philippines Diliman
Roy B. Tumlos ⋅ PH National Institute of Physics, University of the Philippines Diliman and Department of Physical Sciences and Mathematics, University of the Philippines Manila
Henry J. Ramos ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

Polymorphic Si₃N₄ are synthesized using a magnetized sheet plasma negative ion source. XRD analysis showed that α- Si₃N₄ is present at ~43 degrees with a d-value of 2.069 and three prominent peaks of β-Si₃N₄ are also seen at ~50, 69 and 74 degrees with d-values of 1.793, 1.350, and 1.269 respectively, in all samples. Synthesis of Si3N4 was done by directly immersing silicon substrates in argon-nitogen plasma. In the study, substrate subjected to a longer discharge cleaning time produce more β-Si₃N₄.

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Issue

2009: Proceedings of the 27th Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2009-7A-05

Section

Optics and Plasma Physics

Published

2009-10-28

How to Cite

[1]

AM Ulano, G Malapit, RPB Viloan, M Villamayor, RB Tumlos, and HJ Ramos, Si₃N₄ synthesis using a magnetized sheet plasma negative ion source, Proceedings of the Samahang Pisika ng Pilipinas 27, SPP-2009-7A-05 (2009). URL: https://proceedings.spp-online.org/article/view/SPP-2009-7A-05.