Intense terahertz emission from surface-illuminated GaAs grown on Si(100) and Si(111) substrates

Authors

  • Elmer Estacio Institute of Laser Engineering, Osaka University
  • Satoru Takatori Institute of Laser Engineering, Osaka University
  • Minh Hong Pham Institute of Laser Engineering, Osaka University
  • Marilou Cadatal-Raduban Institute of Laser Engineering, Osaka University
  • Jacque Lynn Gabayno Institute of Laser Engineering, Osaka University
  • Nobuhiko Sarukura Institute of Laser Engineering, Osaka University
  • John Vincent Misa National Institute of Physics, University of the Philippines Diliman
  • Rafael Jaculbia National Institute of Physics, University of the Philippines Diliman
  • Michael Defensor National Institute of Physics, University of the Philippines Diliman
  • Armando Somintac National Institute of Physics, University of the Philippines Diliman
  • Arnel Salvador National Institute of Physics, University of the Philippines Diliman

Abstract

We present results on the generation of terahertz radiation from femtosecond laser-irradiated GaAs layers grown on Si(100) and Si(111) substrates. Results show that the terahertz emission is an order of magnitude stronger than that of a bulk GaAs wafer. GaAs layers grown on Si(100) appear to have stronger emission compared with their Si(111) counterpart although the disparity is not very significant. This enhancement to the GaAs-related emission is presently ascribed to the strain field at the GaAs/Si interface. These results show proof of concept on the feasibility of terahertz optoelectronics being integrated into the existing semiconductor technology.

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Published

2009-10-28

How to Cite

[1]
“Intense terahertz emission from surface-illuminated GaAs grown on Si(100) and Si(111) substrates”, Proc. SPP, vol. 27, no. 1, pp. SPP–2009, Oct. 2009, Accessed: Mar. 30, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP-2009-3B-04