Growth and optical polarization properties of high-quality AlN and AlGaN/AlN quantum wells

Authors

  • Ryan G. Banal ⋅ JP Department of Electronic Science and Engineering, Kyoto University
  • Mitsuro Funato ⋅ JP Department of Electronic Science and Engineering, Kyoto University
  • Yoichi Kawakami ⋅ JP Department of Electronic Science and Engineering, Kyoto University

Abstract

High-quality AlN and Alâ‚“Gaâ‚â‚‹â‚“N/AlN multiple quantum wells (MQWs) (x>0.69) were fabricated by modified migration enhanced epitaxy based on metalorganic vapor phase epitaxy, and their structural and optical polarization properties were studied. High-quality AlN was confirmed by narrow x-ray diffraction (XRD) linewidth and for MQWs from satellite peaks, Al composition, well and barrier widths were estimated. Photoluminescence spectroscopy revealed predominant polarization direction in ~1.5-nm-thick QWs switched from GaN-like E⊥c to AlN-like E∥c at x~0.83. This x much higher than ever reported is due to strain and quantum confinement effects on valence band ordering. Decreasing the well width also promotes E⊥c polarization.

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Published

2009-10-28

How to Cite

[1]
“Growth and optical polarization properties of high-quality AlN and AlGaN/AlN quantum wells”, Proc. SPP, vol. 27, no. 1, pp. SPP–2009, Oct. 2009, Accessed: Apr. 06, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP-2009-2B-01