Growth and characterization of catalyst-free gallium arsenide nanorods on silicon substrates via molecular beam epitaxy
Abstract
Gallium arsenide nanorods were grown on [111] and [100] oriented silicon substrates via catalyst free growth using molecular beam epitaxy. Scanning electron microscopy reveals that the nanorods lengths range from 1-30 microns with diameter ranging from 60-200nm at densities of 6.2 nr/umĀ². Raman scattering spectroscopy reveals broadening and down shifting of the LO phonon peaks indicative of nanorod formation. Photoluminescence spectra show a slight blue shift in the peaks of the samples corresponding to weak quantum confinement.