Growth and characterization of catalyst-free gallium arsenide nanorods on silicon substrates via molecular beam epitaxy

Authors

  • John V. Misa National Institute of Physics, University of the Philippines Diliman
  • Ma. Herminia M. Balgos National Institute of Physics, University of the Philippines Diliman
  • Rafael B. Jaculbia National Institute of Physics, University of the Philippines Diliman
  • Jeremy G. Porquez National Institute of Physics, University of the Philippines Diliman
  • Michael J. Defensor National Institute of Physics, University of the Philippines Diliman
  • Armando S. Somintac National Institute of Physics, University of the Philippines Diliman
  • Arnel A. Salvador National Institute of Physics, University of the Philippines Diliman

Abstract

Gallium arsenide nanorods were grown on [111] and [100] oriented silicon substrates via catalyst free growth using molecular beam epitaxy. Scanning electron microscopy reveals that the nanorods lengths range from 1-30 microns with diameter ranging from 60-200nm at densities of 6.2 nr/umĀ². Raman scattering spectroscopy reveals broadening and down shifting of the LO phonon peaks indicative of nanorod formation. Photoluminescence spectra show a slight blue shift in the peaks of the samples corresponding to weak quantum confinement.

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Issue

Article ID

SPP-2009-1B-03

Section

Nanomaterials

Published

2009-10-28

How to Cite

[1]
JV Misa, MHM Balgos, RB Jaculbia, JG Porquez, MJ Defensor, AS Somintac, and AA Salvador, Growth and characterization of catalyst-free gallium arsenide nanorods on silicon substrates via molecular beam epitaxy, Proceedings of the Samahang Pisika ng Pilipinas 27, SPP-2009-1B-03 (2009). URL: https://proceedings.spp-online.org/article/view/SPP-2009-1B-03.