Improved GaAs/AlGaAs heterostructure grown on (100) GaSb substrate via molecular beam epitaxy
Abstract
The effect of unstrained AlAs/GaAs superlattice buffer and growth temperature on GaAs/AlGaAs heterostructure grown on GaSb substrate was investigated. The quality of the layers was assessed using high resolution x ray diffraction and low temperature photoluminescence. Sharper full width at half maximum (0.2925°) was obtained for the GaAs film grown at 680°C than the film grown at 570°C. Photoluminescence was also exhibited by the GaAs film grown at 680°C. The GaAs/AlGaAs grown at 680°C and with superlattice buffer demonstrated a narrow x-ray diffraction peak-width (0.26°) and a photoluminescence spectrum.