Growth and characterization of strained InxGa1-xAs/GaAs superlattice on GaAs(001) substrate
Abstract
InxGa1-xAs/GaAs superlattice structures were successfully grown on GaAs(001) substrate via Molecular Beam Epitaxy. The period thicknesses of the superlattices (196 Å, 211 Å, and 174 Å for samples A, B and C, respectively) and Indium mole fractions of InGaAs layers (0.155, 0.166, and 0.195 for samples A, B and C, respectively) were computed using XRD analysis. The period thickness and mole fraction of sample C were found to deviate from their expected values. This discrepancy was attributed to the generation of misfit dislocation at the heterointerface of the superlattice, which led to the strain relaxation in InGaAs layers. This was confirmed by room-temperature photoluminescence measurements of the superlattice.