Fabrication of air bridge structures via electrochemical plating and RF magnetron sputtering deposition

Authors

  • Fritz Christian Awitan National Institute of Physics, University of the Philippines Diliman
  • Oliver Semblante National Institute of Physics, University of the Philippines Diliman
  • Jonathan Azares National Institute of Physics, University of the Philippines Diliman
  • Ronel Christian Roca National Institute of Physics, University of the Philippines Diliman
  • Maria Emma Villamin National Institute of Physics, University of the Philippines Diliman
  • Jennifer Anne Constantino National Institute of Physics, University of the Philippines Diliman
  • Michael Defensor National Institute of Physics, University of the Philippines Diliman
  • Armando Somintac National Institute of Physics, University of the Philippines Diliman
  • Arnel Salvador National Institute of Physics, University of the Philippines Diliman

Abstract

Air bridges are indispensable structures in microelectro-mechanical systems (MEMS) because they provide high speed interconnects by reducing the stray capacitances. In this paper, we report a novel method employing photolithography to define the structure prior to sputtering metallization. The photolithography process was also tested using the electrochemical plating (ECP) set-up of the Condensed Matter Physics Laboratory. SEM results show the success of developing air bridges using the aforementioned methods.

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Issue

Article ID

SPP-2008-PA-12

Section

Poster Session A (Materials, Optical, and Plasma Physics)

Published

2008-10-22

How to Cite

[1]
FC Awitan, O Semblante, J Azares, RC Roca, ME Villamin, JA Constantino, M Defensor, A Somintac, and A Salvador, Fabrication of air bridge structures via electrochemical plating and RF magnetron sputtering deposition, Proceedings of the Samahang Pisika ng Pilipinas 26, SPP-2008-PA-12 (2008). URL: https://proceedings.spp-online.org/article/view/SPP-2008-PA-12.