Effect of argon plasma pre-cleaning on thin film quality in the 1064 nm Nd:YAG pulsed laser ablation of Bi2Sr2CaCu2O8+δ on MgO substrate
Abstract
MgO (001) single crystal substrates were irradiated with argon plasma prior to thin film deposition. The optimum discharged current of 4.0 mA at 30 minutes exposure time in argon plasma of MgO prior to deposition produce highly c-axis Bi2Sr2CaCu2O8+δ (Bi-2212) superconducting thin films by 1064 nm Nd:YAG pulsed laser ablation. It was found out that argon plasma cleaning prior to deposition is effective in improving film wettability on MgO substrate. SEM images of the film with treated substrate showed reduction of surface roughness compared to film grown on untreated substrate. XRD measurements on film with plasma cleaned substrates shows improved crystallinity. Resistivity measurements of the film also showed enhancement of critical temperature, Tc.